Thermal Chemical Vapor Deposition
열화학증착(TCVD)기술의 주요 사항은 기판 위에 얇은 필름이 합성되는 고압의 reactor로
1,000ºC 가량의 고온에서 가스들을 유입시키는 것입니다.
Size
2300(W) x 1770(H) x 750(D)
특징
size (mm): 2300(W) x 1770(H) x 750(D)
컴퓨터 제어 자동 시스템
graphene, CNT, h-BN TMDC 성장에 최적화
Water-cooled end chambers doors.
온도 조절: ~1,100 ℃
필름 두께의 균일성: ≤+-3%
테스트 균일: ≤+-3%
빠른 가열, 냉각을 위한 모터 제어 가동 히터
안전 캐비닛
* 가격은 상담 후 결정됩니다.
(표준 부분에서 다른 사용자 정의는 전체 가격에 영향을 미칠 것입니다.)
기술사양(표준)
Thermal CVD Auto Operation system
Both End chamber(Stainess) - All parts cooling by water
Quartz Main chamber
Gas control unit ( Mass flow controller) - 3channel standard
340liter/min Oil rotary pump
Pneumatic On/off valve with Down stream Auto pressure control Throttle valve
with controller
Programmable Temperature controller
High Temperature Furnace(Max1200℃)
Rapid Cooling system by furnace moving
Atmospheric and Vacuum Processing
Anti-contamination system by inner tube
Vacuum gauge unit(Capacitance/Convectron)
1 year warranty
On-site install and training
System Program ( Auto processing system)
Furnace for source evaporation
Safety interlock system(Water / Air)
기술사양(추가)
Max temp 1500℃ Furnace by SIC source
Rapid thermal processing furnace by IR lamp source
MF power induction heating process Max temp 1600℃
MFC(Mass flow controller) addition total 12channel
Dry vacuum pump ( Scroll / booster / industry)
Gas Safety interlock system for gas leak
RF plasma ( ICP type )
Tungsten filament gas source cracking
High Vacuum processing option
(Pump/Gauge/valve unit)
Source delivery system ( Bubbler / Gas / Solid )
System Utility ( Chiller / scrubber / gas cabinet )
소모품
K-type Thermocouple (Option : R-type)
Furnace heating element (Furnace repair)
Vacuum sensor
Oil in Rotary Oil Pump
O-ring
Quartz tube